E04: High Power Electromagnetics and Intentional EMI (2)

Monday, August 18  16:00-17:40,  Room #15

Session Chairs: William Radasky, Lihua Shi

The sessions address intentional electromagnetic interference (IEMI), or the intentional malicious generation of electromagnetic energy introducing noise or signals into electric and electronic systems, thus disrupting, confusing or damaging these systems for terrorist or criminal purposes. The technical area of HPE consists of the physics and engineering associated with electromagnetic sources where nonlinear effects associated with high-field regions (and air breakdown) must be included in the analysis and design. This include EMP simulators, high-power narrowband and mesoband sources and antennas, and hyperband (impulse) sources and antennas.

16:00  E04.1   INTERFERENCE EFFECTS OF MULTIPLE PULSES ON MICROCONTROLLER

Z. Hui, S. Lihua, Z. Yinghui

National Key Lab on Electromagnetic Environmental Effects and Electro-optical Engineering, PLA University of Science and Technology, Nanjing, Jiangsu, China


16:20  E04.2   SOME FEATURES OF THE PULSE ELECTRICAL DISTURBANCES INFLUENCE ON DIGITAL DEVICES FUNCTIONING

Y. V. Parfenov1, W. A. Radasky2, B. A. Titov1, L. N. Zdoukhov1

1Joint Institute for High Temperatures, Russian Academy of Sciences, Moscow, Russia
2Metatech Corporation, Goleta, CA, United States


16:40  E04.3   EXPERIMENTAL INVESTIGATION AND ELECTRO-THERMAL-STRESS MODELING OF GAAS AND LDMOS FET UNDER CONDUCTIVE ELECTROMAGNETIC PULSE (EMP)

L. Zhou1, W. -F. Zhou1, Z. Cheng1, L. Lin1, W. -Y. Yin2, J. -F. Mao1

1Center for Microwave and RF Technologies (CMRFT), Key Laboratory of Ministry of Education of Design, Shanghai Jiao Tong University, Shanghai, China
2Center for Optics and EM Research, State Key Lab of MOI, Zhejiang University, Hangzhou, China


17:00  E04.4   TRANSIENT RESPONSES ANALYSIS OF SOME ULTRA-WIDEBAND FLITERS IN THE PRESENCEOF WIDEBAND ELECTROMAGNETIC PLUSES

Q. -F. Liu

EMC LAB, wuhan, China


17:20  E04.5   BRIEF HISTORICAL REVIEW AND BIBLIOGRAPHY FOR INTENTIONAL ELECTROMAGNETIC INTERFERENCE (IEMI)

W. A. Radasky1, M. Bäckström2

1Metatech Corporation, Goleta, CA, United States
2Saab Aeronautics, Linkoping, Sweden