D02: Micro and Nanophotonics (2)

Monday, August 18  09:40-11:00,  Room #21

Session Chairs: Franz Kärtner, Mike Watts

High index contrast micro- and nano-photonic devices, photonic crystals, plasmonics, electronic and photonic integration. Highdensity integrated photonics based on group IV as well as group III-VI semiconductor materials, metals and dielectrics. Passive and active devices and a combination thereof, design tools, or micro and nano-fabrication techniques. Nonlinear effects in micro and nano devices, linear and nonlinear effects enhanced by high index contrast waveguides, photonic crystals and plasmons.

9:40  D02.1   STEERING AND TUNING OF ON-CHIP OPTICAL BEAMS

F. Gan, W. Li, J. Du, H. Li, A. Wu, Z. Sheng, X. Wang, S. Zou

State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, China


10:00  D02.2   PHOTONIC ANALOG-TO-DIGITAL CONVERTERS

K. E. Al Qubaisi, A. Khilo

Institute Center for Microsystems (iMicro), Masdar Institute of Science and Technology, Abu Dhabi, United Arab Emirates


10:20  D02.3   TRAVELING-WAVE PHOTON-PHONON COUPLING IN SILICON

P. T. Rakich

Applied Physics, Yale University, New Haven, United States


10:40  D02.4   HIGH DATA RATE SIMULATION OF PHASE SHIFTERS IN SILICON-ON-INSULATOR

C. E. J. Png1, M. Sun2, S. T. Lim1

1Electronics & Photonics, A*STAR, Singapore, Singapore
2Electronics & Photonics, Optic2Connect (O2C) Pte Ltd, Singapore, Singapore